Model L116SF300 with 3 Wave option L3W544.830 and  LRSY stage shown above

multiwavelength ellipsometers description
The Multiwavelength Laser Ellipsometers give the user greater versatility in thickness and refractive index measurement of thin transparent and semi-transparent films. Laser light sources have ample light intensity for increased measurement accuracy of absorbing and rough scattering films. Laser sources have the added advantage of being spectrally precise, stable and long lasting. Their use permits optimum instrument design in optics, detectors and other components so that measurements can be made highly accurate. Separate laser sources also offer backup reliability important to continuous operation.

features

• Measure thick films without thickness period ambiguity
• Variable angle useful for difficult to measure films.
• Get refractive index in near period regions
• Trouble-free, no moving parts patented StokesMeter™ measurement head.
• Measures complete state of polarization useful for rough,scattering samples.
• Measure photoresist index closer to exposure wavelengths
• Get dispersion with two or three values of refractive index
• Analyze difficult to measure films like Poly, Plasma Nitride and Silicon on Sapphire
• Improves modeling results using more measured data for complicated structures 
• Simpler and less complex than spectroscopic ellipsometers.

 laser light sources available for our Stokes Ellipsometers:

       405 nm Laser Diode
       544 nm HeNe Gas Laser
       633 nm HeNe Gas Laser standard
       830 nm Laser Diode

Model LSE-WS with 2 Wave option L2W544 shown above

 our Ellipsometer models:
 LSE
 LSE-WS
 L116SF300
 L115S300
 L104ST
L117F300

can be equipped with the following laser options:

 LASER SUBSTITUTION

LS405    Substitutes 405 nm  Blue laser diode in place of standard 633 nm HeNe Gas Laser  $13K
LS544    Substitutes 544 nm Green HeNe Gas laser in place of 633 nm HeNe Gas Laser  $4K
LS830    Substitutes 830 nm laser diode in place of 633 nm HeNe Gas Laser $9K

ADD ADDITIONAL LASER FOR A 2 WAVELENGTH ELLIPSOMETER 

L2W405    Adds 405 nm Blue Laser Diode to 633 nm ellipsometer $21K
L2W544    Adds 544 nm Green HeNe Gas Laser to 633 nm ellipsometer $15K
L2W830    Adds 830 nm laser diode to 633 nm ellipsometer  $18K 

ADD TWO ADDITIONAL LASERS FOR A 3 WAVELENGTH ELLIPSOMETER  

L3W405.544   Adds 405 Laser Diode and 544 Green Gas Laser to 633 nm ellipsometer $26K
L3W405.830   Adds 405 Laser Diode and 830nm laser diode to 633 nm ellipsometer $29K            
L3W544.830   Adds 544 Green Gas Laser and 830nm laser diode to 633 nm ellipsometer $23K
 

L-SCAT SOLAR CELL / SCATTERING SAMPLE MEASUREMENT OPTION  $2K

Rough scattering samples common in the solar cell industry are difficult to measure accurately with most ellipsometers because of the loss of signal strength and depolarization of the measurement beam. Although there are ways to boost the signal strength and capture more scattered light, dealing with depolarization is much more difficult and requires the determination of the complete state of polarization namely the measurement of the 4 stokes parameters S0, s1, s2, s3. Gaertner Stokes Ellipsometers do this naturally as our StokesMeterä polarimeter is used as the ellipsometer analyzer. This gives Stokes Ellipsometers the unique ability to instantly separate the polarized from the unpolarized components of the measuring beam thereby delivering a highly accurate measurement of film thickness and index based only on the totally polarized component of light. The L-SCAT scatter option includes a hardware modification to capture more of the scattered light from rough, textured surfaces and a program display of the degree of polarization P.

software for multiwavelength laser ellipsometers

LGEMP 4 Layer Absorbing Program for Windows and LMOD 4 Layer Simultaneous Modeling Program for Windows are included standard with Multiwave Ellipsometers.

1.523 and 1.550 micron Laser Diode  wavelengths are available for
Infra Red IR Variable Angle Rotating Analyzer Ellipsometers  

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